Scott Semiconductor Process Gases
These products feature both guaranteed concentration and accuracy for each component in the mixture, making them among the most widely used process gases in the semiconductor industry.
Arsine AsH3
Typically used for silicon semiconductor doping applications and photovoltaic film deposition where the N-type dopant property provided by arsine is desired.
Download arsine specifications.
Diborane
Ideal for silicon semiconductor doping applications and photovoltaic film deposition where the P-type dopant property provided by boron is desired.
Download diborane specifications.
Germane GeH4
Ideal for silicon semiconductor doping and photovoltaic film deposition applications.
Download germane specifications.
Phosphine PH3
Typically used for silicon semiconductor doping applications and photovoltaic film deposition where the N-type dopant property provided by phosphorus is desired.
Download phosphine specifications.
Silane SiH4
Ideal for silicon semiconductor and photovoltaic film deposition applications.
Download silane specifications.
Trimethylboron B(CH3)3
TMB mixtures are ideal for photovoltaic film deposition.
Download TMB mixtures specifications.
ASML Lens Gases
Air Liquide provides a complete selection of photolithography lens gas mixtures suitable for ASML and other photolithographic lens systems.
Download ASML lens gases specifications.